<?xml version="1.0" encoding="utf-8"?>
<journal>
<title>IRANIAN JOURNAL OF ELECTRICAL AND ELECTRONIC ENGINEERING</title>
<title_fa></title_fa>
<short_title>IJEEE</short_title>
<subject>Engineering &amp; Technology</subject>
<web_url>http://ijeee.iust.ac.ir</web_url>
<journal_hbi_system_id>18</journal_hbi_system_id>
<journal_hbi_system_user>agent2</journal_hbi_system_user>
<journal_id_issn>1735-2827</journal_id_issn>
<journal_id_issn_online>1735-2827</journal_id_issn_online>
<journal_id_pii></journal_id_pii>
<journal_id_doi></journal_id_doi>
<journal_id_iranmedex></journal_id_iranmedex>
<journal_id_magiran></journal_id_magiran>
<journal_id_sid></journal_id_sid>
<journal_id_nlai></journal_id_nlai>
<journal_id_science></journal_id_science>
<language>en</language>
<pubdate>
	<type>jalali</type>
	<year>1391</year>
	<month>9</month>
	<day>1</day>
</pubdate>
<pubdate>
	<type>gregorian</type>
	<year>2012</year>
	<month>12</month>
	<day>1</day>
</pubdate>
<volume>8</volume>
<number>4</number>
<publish_type>online</publish_type>
<publish_edition>1</publish_edition>
<article_type>fulltext</article_type>
<articleset>
	<article>


	<language>en</language>
	<article_id_doi></article_id_doi>
	<title_fa></title_fa>
	<title>Design and Fabrication of a Narrow-bandwidth Micromechanical Ring Filter using a Novel Process in UV-LIGA Technology</title>
	<subject_fa>2-Semiconductor Devices </subject_fa>
	<subject>Semiconductor Devices </subject>
	<content_type_fa>Research Paper </content_type_fa>
	<content_type>Research Paper </content_type>
	<abstract_fa></abstract_fa>
	<abstract>This paper presents the design and a new low-cost process for fabrication of a second-order micromechanical filter using UV-LIGA technology. The micromechanical filter consists of two identical bulk-mode ring resonators, mechanically coupled by a flexural-mode beam. A new lumped modeling approach is presented for the bulk-mode ring resonators and filter. The validity of the analytical derivation is investigated using the finite element method by ANSYS software. The new low-cost fabrication process is used to achieve a high aspect ratio of 16 with 3 μm gap spacing. The rigid graphite serves as a low-cost primary substrate and plating base of nickel as structural material. The fabrication process needs only three UV-lithography steps with Mylar masks to fabricate the main structure and pattern the printed circuit board as a secondary substrate. The frequency response of the fabricated filter is characterized as a function of the DC-bias voltage using a fully differential drive and sense interface circuit. The experimental results demonstrates micromechanical filter with center frequency in the vicinity of 10.31 MHz and percent bandwidth less than 0.3% using a DC-bias voltage of 60 V. The detailed fabrication process can be applied as an appropriate low-cost alternative to X-ray LIGA and silicon-based micromechanical filters.</abstract>
	<keyword_fa></keyword_fa>
	<keyword>Micromechanical Ring Filter,Nickel Electroplating,SU-8 Photoresist,UV-LIGA,</keyword>
	<start_page>280</start_page>
	<end_page>289</end_page>
	<web_url>http://ijeee.iust.ac.ir/browse.php?a_code=A-10-612-3&amp;slc_lang=en&amp;sid=1</web_url>


<author_list>
	<author>
	<first_name>A.</first_name>
	<middle_name></middle_name>
	<last_name>Bijari</last_name>
	<suffix></suffix>
	<first_name_fa></first_name_fa>
	<middle_name_fa></middle_name_fa>
	<last_name_fa></last_name_fa>
	<suffix_fa></suffix_fa>
	<email>a.bijari@gmail.com</email>
	<code>180031947532846002043</code>
	<orcid>180031947532846002043</orcid>
	<coreauthor>Yes
</coreauthor>
	<affiliation>Department of Electrical Engineering, Faculty of Engineering, Ferdowsi University of Mashhad (FUM)</affiliation>
	<affiliation_fa></affiliation_fa>
	 </author>


	<author>
	<first_name>S. H.</first_name>
	<middle_name></middle_name>
	<last_name>Keshmiri</last_name>
	<suffix></suffix>
	<first_name_fa></first_name_fa>
	<middle_name_fa></middle_name_fa>
	<last_name_fa></last_name_fa>
	<suffix_fa></suffix_fa>
	<email>keshmiri@um.ac.ir</email>
	<code>180031947532846002044</code>
	<orcid>180031947532846002044</orcid>
	<coreauthor>No</coreauthor>
	<affiliation>Department of Electrical Engineering, Faculty of Engineering, Ferdowsi University of Mashhad (FUM)</affiliation>
	<affiliation_fa></affiliation_fa>
	 </author>


	<author>
	<first_name>W.</first_name>
	<middle_name></middle_name>
	<last_name>Wanburee</last_name>
	<suffix></suffix>
	<first_name_fa></first_name_fa>
	<middle_name_fa></middle_name_fa>
	<last_name_fa></last_name_fa>
	<suffix_fa></suffix_fa>
	<email>Electrical.sut@gmail.com</email>
	<code>180031947532846002045</code>
	<orcid>180031947532846002045</orcid>
	<coreauthor>No</coreauthor>
	<affiliation>School of Electrical Engineering, Institute of Engineering, Suranaree University of Technology (SUT)</affiliation>
	<affiliation_fa></affiliation_fa>
	 </author>


	<author>
	<first_name>Ch.</first_name>
	<middle_name></middle_name>
	<last_name>Sriphung</last_name>
	<suffix></suffix>
	<first_name_fa></first_name_fa>
	<middle_name_fa></middle_name_fa>
	<last_name_fa></last_name_fa>
	<suffix_fa></suffix_fa>
	<email>chanwut@slri.or.th</email>
	<code>180031947532846002046</code>
	<orcid>180031947532846002046</orcid>
	<coreauthor>No</coreauthor>
	<affiliation>Synchrotron Light Research Institution (SLRI)</affiliation>
	<affiliation_fa></affiliation_fa>
	 </author>


	<author>
	<first_name>R.</first_name>
	<middle_name></middle_name>
	<last_name>Phatthanakun</last_name>
	<suffix></suffix>
	<first_name_fa></first_name_fa>
	<middle_name_fa></middle_name_fa>
	<last_name_fa></last_name_fa>
	<suffix_fa></suffix_fa>
	<email>rungrueang@slri.or.th</email>
	<code>180031947532846002047</code>
	<orcid>180031947532846002047</orcid>
	<coreauthor>No</coreauthor>
	<affiliation>Synchrotron Light Research Institution (SLRI)</affiliation>
	<affiliation_fa></affiliation_fa>
	 </author>


</author_list>


	</article>
</articleset>
</journal>
